Metal-assisted chemical etching of Ge(100) surfaces in water toward nanoscale patterning

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Metal-assisted chemical etching of Ge(100) surfaces in water toward nanoscale patterning

We propose the metal-assisted chemical etching of Ge surfaces in water mediated by dissolved oxygen molecules (O2). First, we demonstrate that Ge surfaces around deposited metallic particles (Ag and Pt) are preferentially etched in water. When a Ge(100) surface is used, most etch pits are in the shape of inverted pyramids. The mechanism of this anisotropic etching is proposed to be the enhanced...

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ژورنال

عنوان ژورنال: Nanoscale Research Letters

سال: 2013

ISSN: 1556-276X

DOI: 10.1186/1556-276x-8-151